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Carrier lifetime increase in silicon by gettering with a MeV-implanted carbon-rich layer.

Authors :
Skorupa, W.
Kögler, R.
Schmalz, K.
Source :
Electronics Letters (Institution of Engineering & Technology); 10/25/1990, Vol. 26 Issue 22, p1898-1899, 2p
Publication Year :
1990

Details

Language :
English
ISSN :
00135194
Volume :
26
Issue :
22
Database :
Complementary Index
Journal :
Electronics Letters (Institution of Engineering & Technology)
Publication Type :
Academic Journal
Accession number :
86340079
Full Text :
https://doi.org/10.1049/el:19901222