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Comparative Analysis of MIS Capacitance Structures With High-k Dielectrics Under Gamma, ^16O and p Radiation.
- Source :
- IEEE Transactions on Nuclear Science; Apr2012 Part 2, Vol. 59 Issue 4, p767-772, 6p
- Publication Year :
- 2012
-
Abstract
- MIS capacitance structures, with Hafnium Oxide, Alumina and nanolaminate as dielectrics were studied under gamma photons ^60\Co, 25 MeV oxygen ions and 10 MeV protons radiation using capacitance-voltage (C-V) characterization. [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 00189499
- Volume :
- 59
- Issue :
- 4
- Database :
- Complementary Index
- Journal :
- IEEE Transactions on Nuclear Science
- Publication Type :
- Academic Journal
- Accession number :
- 84489164
- Full Text :
- https://doi.org/10.1109/TNS.2012.2187217