High yield dense array of very-high-aspect-ratio micro metal posts by photo-electrochemical etching of silicon and electroplating with vacuum degassing.

MLA

Guangyi Sun, et al. “High Yield Dense Array of Very-High-Aspect-Ratio Micro Metal Posts by Photo-Electrochemical Etching of Silicon and Electroplating with Vacuum Degassing.” 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS), Jan. 2010, pp. 340–43. EBSCOhost, https://doi.org/10.1109/MEMSYS.2010.5442497.

APA

Guangyi Sun, Hur, J., Xin Zhao, & Chang-Jin Kim. (2010). High yield dense array of very-high-aspect-ratio micro metal posts by photo-electrochemical etching of silicon and electroplating with vacuum degassing. 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS), 340–343. https://doi.org/10.1109/MEMSYS.2010.5442497

Chicago

Guangyi Sun, J. Hur, Xin Zhao, and Chang-Jin Kim. 2010. “High Yield Dense Array of Very-High-Aspect-Ratio Micro Metal Posts by Photo-Electrochemical Etching of Silicon and Electroplating with Vacuum Degassing.” 2010 IEEE 23rd International Conference on Micro Electro Mechanical Systems (MEMS), January, 340–43. doi:10.1109/MEMSYS.2010.5442497.