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Multi-functional annealing using flexibly-shaped-pulse flash lamp annealing (FSP-FLA) for high-k/metal gated CMOS devices.

Authors :
Aoyama, T.
Kato, S.-i.
Onizawa, T.
Ikeda, K.
Ohji, Y.
Source :
2009 International Workshop on Junction Technology; 2009, p110-115, 6p
Publication Year :
2009

Details

Language :
English
ISBNs :
9781424433193
Database :
Complementary Index
Journal :
2009 International Workshop on Junction Technology
Publication Type :
Conference
Accession number :
81536130
Full Text :
https://doi.org/10.1109/IWJT.2009.5166232