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Optical emission spectroscopy characterization of a hydrogen diluted silane plasma for microcrystalline silicon thin film deposition.

Authors :
Chang, C.H.
Du, C.C.
Chen, K.C.
Huang, J.R.
Chang, Y.L.
Leou, K.C.
Source :
2009 IEEE International Conference on Plasma Science - Abstracts; 2009, p1-1, 1p
Publication Year :
2009

Details

Language :
English
ISBNs :
9781424426171
Database :
Complementary Index
Journal :
2009 IEEE International Conference on Plasma Science - Abstracts
Publication Type :
Conference
Accession number :
81475091
Full Text :
https://doi.org/10.1109/PLASMA.2009.5227387
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