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Improvements of Fermi-level pinning and NBTI by fluorinated HfO2-CMOS.

Authors :
Chao-Sung Lai
Woei-Cherng Wu
Huai-Hsien Chiu
Jer-Chyi Wang
Pai-Chi Chou
Tien-Sheng Chao
Source :
2010 IEEE International Conference of Electron Devices & Solid-State Circuits (EDSSC); 2010, p1-4, 4p
Publication Year :
2010

Details

Language :
English
ISBNs :
9781424499977
Database :
Complementary Index
Journal :
2010 IEEE International Conference of Electron Devices & Solid-State Circuits (EDSSC)
Publication Type :
Conference
Accession number :
81370956
Full Text :
https://doi.org/10.1109/EDSSC.2010.5713757