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Critical gate voltage and digital breakdown: Extending post-breakdown reliability margin in ultrathin gate dielectric with thickness ≪ 1.6 nm.
- Source :
- 2009 IEEE International Reliability Physics Symposium; 2009, p696-699, 4p
- Publication Year :
- 2009
Details
- Language :
- English
- ISBNs :
- 9781424428885
- Database :
- Complementary Index
- Journal :
- 2009 IEEE International Reliability Physics Symposium
- Publication Type :
- Conference
- Accession number :
- 81322688
- Full Text :
- https://doi.org/10.1109/IRPS.2009.5173332