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Critical gate voltage and digital breakdown: Extending post-breakdown reliability margin in ultrathin gate dielectric with thickness ≪ 1.6 nm.

Authors :
Lo, V.L.
Pey, K.L.
Ranjan, R.
Tung, C.H.
Shih, J.R.
Wu, K.
Source :
2009 IEEE International Reliability Physics Symposium; 2009, p696-699, 4p
Publication Year :
2009

Details

Language :
English
ISBNs :
9781424428885
Database :
Complementary Index
Journal :
2009 IEEE International Reliability Physics Symposium
Publication Type :
Conference
Accession number :
81322688
Full Text :
https://doi.org/10.1109/IRPS.2009.5173332