Air gap integration for the 45nm node and beyond.

Authors :: Daamen, R.
Verheijden, G.J.A.M.
Bancken, P.H.L.
Vandeweyer, T.
Michelon, J.
Nguyen Hoang, V.
Hoofman, R.J.O.M.
Gallagher, M.K.
Source :: Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005; 2005, p240-242, 3p
Publication Year :: 2005

Language :: English
ISBNs :: 9780780387522
Database :: Complementary Index
Journal :: Proceedings of the IEEE 2005 International Interconnect Technology Conference, 2005
Publication Type :: Conference
Accession number :: 81248803
Full Text :: https://doi.org/10.1109/IITC.2005.1499997