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"Sea of Kelvin" multiple-pattern arrangement interconnect characterization for low-k/Cu dual damascene and its findings.

Authors :
Okazaki, M.
Hatano, M.
Yoshida, K.
Shibasaki, S.
Kaneko, H.
Yoda, T.
Hayasaka, N.
Source :
Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729); 2004, p211-213, 3p
Publication Year :
2004

Details

Language :
English
ISBNs :
9780780383081
Database :
Complementary Index
Journal :
Proceedings of the IEEE 2004 International Interconnect Technology Conference (IEEE Cat. No.04TH8729)
Publication Type :
Conference
Accession number :
81248461
Full Text :
https://doi.org/10.1109/IITC.2004.1345749