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The impact of substrate bias on proton damage in 130 nm CMOS technology.

Authors :
Haugerud, B.M.
Venkataraman, S.
Sutton, A.K.
Prakash, A.P.G.
Cressler, J.D.
Niu, G.
Marshall, P.W.
Joseph, A.J.
Source :
IEEE Radiation Effects Data Workshop, 2005; 2005, p117-121, 5p
Publication Year :
2005

Details

Language :
English
ISBNs :
9780780393677
Database :
Complementary Index
Journal :
IEEE Radiation Effects Data Workshop, 2005
Publication Type :
Conference
Accession number :
81166754
Full Text :
https://doi.org/10.1109/REDW.2005.1532676