Excimer-laser activation of dopants in silicon: a new concept for a uniform treatment over a whole die area.

Details

Language :

English

ISBNs :

9784891140199

Database :

Complementary Index

Journal :

Extended Abstracts of the Second International Workshop on Junction Technology. IWJT. (IEEE Cat.No.01EX541C)

Publication Type :

Conference

Accession number :

81135024

Full Text :

https://doi.org/10.1109/IWJT.2001.993835