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Ultra-shallow junction formation using flash annealing and advanced doping techniques.

Authors :
Gelpey, J.
McCoy, S.
Kontos, A.
Godet, L.
Hatem, C.
Camm, D.
Chan, J.
Papasouliotis, G.
Scheuer, J.
Source :
Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08); 2008, p82-86, 5p
Publication Year :
2008

Details

Language :
English
ISBNs :
9781424417377
Database :
Complementary Index
Journal :
Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)
Publication Type :
Conference
Accession number :
81134870
Full Text :
https://doi.org/10.1109/IWJT.2008.4540023