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The plasma treatment and dry etching characteristics of organic low-k dielectrics.
- Source :
- 2000 International Microprocesses & Nanotechnology Conference Digest of Papers Microprocesses & Nanotechnology 2000 (IEEE Cat. No.00EX387); 2000, p272-273, 2p
- Publication Year :
- 2000
Details
- Language :
- English
- ISBNs :
- 9784891140045
- Database :
- Complementary Index
- Journal :
- 2000 International Microprocesses & Nanotechnology Conference Digest of Papers Microprocesses & Nanotechnology 2000 (IEEE Cat. No.00EX387)
- Publication Type :
- Conference
- Accession number :
- 81128094
- Full Text :
- https://doi.org/10.1109/IMNC.2000.872757