Back to Search Start Over

Use of bidirectional current stress for in depth analysis of electromigration mechanism.

Authors :
Doyen, L.
Arnaud, L.
Federspiel, X.
Waltz, P.
Wouters, Y.
Source :
2008 IEEE International Reliability Physics Symposium; 2008, p681-682, 2p
Publication Year :
2008

Details

Language :
English
ISBNs :
9781424420490
Database :
Complementary Index
Journal :
2008 IEEE International Reliability Physics Symposium
Publication Type :
Conference
Accession number :
81020882
Full Text :
https://doi.org/10.1109/RELPHY.2008.4558986