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Effective reduction of threshold voltage variability and standby leakage using advanced co-implantation and laser anneal for low power applications.
- Source :
- 2008 IEEE International Electron Devices Meeting; 2008, p1-4, 4p
- Publication Year :
- 2008
Details
- Language :
- English
- ISBNs :
- 9781424423774
- Database :
- Complementary Index
- Journal :
- 2008 IEEE International Electron Devices Meeting
- Publication Type :
- Conference
- Accession number :
- 81019306
- Full Text :
- https://doi.org/10.1109/IEDM.2008.4796849