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Characterization of MOSFETs intrinsic performance using in-wafer advanced Kelvin-contact device structure for high performance CMOS LSIs.

Authors :
Kuroda, R.
Teramoto, A.
Komuro, T.
Weitao Cheng
Watabe, S.
Ching Foa Tye
Sugawa, S.
Ohmi, T.
Source :
2008 IEEE International Conference on Microelectronic Test Structures; 2008, p155-159, 5p
Publication Year :
2008

Details

Language :
English
ISBNs :
9781424418008
Database :
Complementary Index
Journal :
2008 IEEE International Conference on Microelectronic Test Structures
Publication Type :
Conference
Accession number :
81015842
Full Text :
https://doi.org/10.1109/ICMTS.2008.4509331