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Compact low current X-pinch based EUV source for lithography.
- Source :
- 2008 IEEE 35th International Conference on Plasma Science; 2008, p1-1, 1p
- Publication Year :
- 2008
Details
- Language :
- English
- ISBNs :
- 9781424419296
- Database :
- Complementary Index
- Journal :
- 2008 IEEE 35th International Conference on Plasma Science
- Publication Type :
- Conference
- Accession number :
- 81001552
- Full Text :
- https://doi.org/10.1109/PLASMA.2008.4590704