A novel ESD device structure with fully silicide process for mixed high/low voltage operation.

Details

Language :

English

ISBNs :

9781424420391

Database :

Complementary Index

Journal :

2008 15th International Symposium on the Physical & Failure Analysis of Integrated Circuits

Publication Type :

Conference

Accession number :

80957882

Full Text :

https://doi.org/10.1109/IPFA.2008.4588153