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Particle removal performance of 20nm rated filters for advanced wet chemical cleaning.

Authors :
Nose, M.
Tsuzuki, S.
Mizuno, T.
Numaguchi, T.
Source :
2007 International Symposium on Semiconductor Manufacturing; 2007, p1-3, 3p
Publication Year :
2007

Details

Language :
English
ISBNs :
9781424411429
Database :
Complementary Index
Journal :
2007 International Symposium on Semiconductor Manufacturing
Publication Type :
Conference
Accession number :
80942269
Full Text :
https://doi.org/10.1109/ISSM.2007.4446893