Silicon nanowire fabrication using novel hydrogenation-assisted deep reactive ion etching.

Details

Language :

English

ISBNs :

9781424418923

Database :

Complementary Index

Journal :

2007 International Semiconductor Device Research Symposium

Publication Type :

Conference

Accession number :

80940171

Full Text :

https://doi.org/10.1109/ISDRS.2007.4422497