Electrical Defect Density Test Structures for DFM in the Sub-wavelength Lithography Regime with Copper Metallization.

Details

Language :

English

ISBNs :

9784990413804

Database :

Complementary Index

Journal :

2006 IEEE International Symposium on Semiconductor Manufacturing

Publication Type :

Conference

Accession number :

80839743

Full Text :

https://doi.org/10.1109/ISSM.2006.4493012