Dual phase TOSI-gate process on High-K dielectrics in a CMP-less flow.

Details

Language :

English

ISBNs :

9781424403011

Database :

Complementary Index

Journal :

2006 European Solid-State Device Research Conference

Publication Type :

Conference

Accession number :

80820157

Full Text :

https://doi.org/10.1109/ESSDER.2006.307652