Development of photo-resist stripping process using ozone and water vapor.

Authors :: Noda, S.
Miyamoto, M.
Horibe, H.
Oya, I.
Kuzumoto, M.
Kataoka, T.
Source :: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203); 2001, p233-236, 4p
Publication Year :: 2001

Language :: English
ISBNs :: 9780780367319
Database :: Complementary Index
Journal :: 2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)
Publication Type :: Conference
Accession number :: 80769113
Full Text :: https://doi.org/10.1109/ISSM.2001.962956