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Invasion percolation model for abnormal TDDB characteristic of ULK dielectrics with Cu interconnect at advanced technology nodes.

Authors :
Chen, F.
Shinosky, M.
Li, B.
Aitken, J.
Cohen, S.
Bonilla, G.
Simon, A.
McLaughlin, P.
Achanta, R.
Baumann, F.
Parks, C.
Angyal, M.
Source :
2011 IEEE International Reliability Physics Symposium (IRPS); 2011, p2F.2.1-2F.2.8, 1p
Publication Year :
2011

Details

Language :
English
ISBNs :
9781424491131
Database :
Complementary Index
Journal :
2011 IEEE International Reliability Physics Symposium (IRPS)
Publication Type :
Conference
Accession number :
80408610
Full Text :
https://doi.org/10.1109/IRPS.2011.5784466