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Invasion percolation model for abnormal TDDB characteristic of ULK dielectrics with Cu interconnect at advanced technology nodes.
- Source :
- 2011 IEEE International Reliability Physics Symposium (IRPS); 2011, p2F.2.1-2F.2.8, 1p
- Publication Year :
- 2011
Details
- Language :
- English
- ISBNs :
- 9781424491131
- Database :
- Complementary Index
- Journal :
- 2011 IEEE International Reliability Physics Symposium (IRPS)
- Publication Type :
- Conference
- Accession number :
- 80408610
- Full Text :
- https://doi.org/10.1109/IRPS.2011.5784466