Physical IP and advanced SOI design for 22nm SOI technology.

Authors :: Pelloie, J.-L.
Laabidi, S.
Charafeddine, K.
Laplanche, Y.
Source :: 2011 International Symposium on VLSI Technology, Systems & Applications (VLSI-TSA); 2011, p1-2, 2p
Publication Year :: 2011

Language :: English
ISBNs :: 9781424484935
Database :: Complementary Index
Journal :: 2011 International Symposium on VLSI Technology, Systems & Applications (VLSI-TSA)
Publication Type :: Conference
Accession number :: 80367967
Full Text :: https://doi.org/10.1109/VTSA.2011.5872266