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Bulk FinFET fabrication with new approaches for oxide topography control using dry removal techniques.
- Source :
- 2011 12th International Conference on Ultimate Integration on Silicon (ULIS); 2011, p1-3, 3p
- Publication Year :
- 2011
Details
- Language :
- English
- ISBNs :
- 9781457700903
- Database :
- Complementary Index
- Journal :
- 2011 12th International Conference on Ultimate Integration on Silicon (ULIS)
- Publication Type :
- Conference
- Accession number :
- 80364234
- Full Text :
- https://doi.org/10.1109/ULIS.2011.5758015