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Scalable Microwave Plasma Sources From Low to Atmospheric Pressure.
- Source :
- Contributions to Plasma Physics; Aug2012, Vol. 52 Issue 7, p607-614, 8p
- Publication Year :
- 2012
-
Abstract
- There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (10<superscript>3</superscript>-10<superscript>4</superscript> Pa) up to atmospheric pressure (10<superscript>5</superscript> Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them (© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [ABSTRACT FROM AUTHOR]
Details
- Language :
- English
- ISSN :
- 08631042
- Volume :
- 52
- Issue :
- 7
- Database :
- Complementary Index
- Journal :
- Contributions to Plasma Physics
- Publication Type :
- Academic Journal
- Accession number :
- 78644378
- Full Text :
- https://doi.org/10.1002/ctpp.201210057