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Scalable Microwave Plasma Sources From Low to Atmospheric Pressure.

Authors :
Schulz, A.
Büchele, P.
Ramisch, E.
Janzen, O.
Jimenez, F.
Kamm, C.
Kopecki, J.
Leins, M.
Merli, S.
Petto, H.
Mendez, F.R.
Schneider, J.
Schumacher, U.
Walker, M.
Stroth, U.
Source :
Contributions to Plasma Physics; Aug2012, Vol. 52 Issue 7, p607-614, 8p
Publication Year :
2012

Abstract

There are very specific demands on the plasma processes used in various plasma technological applications. Microwave plasmas offer a wide range of applications for different pressures ranging from very low pressure (<0.1 Pa) over low pressure (0.1-100 Pa) and medium pressure (10<superscript>3</superscript>-10<superscript>4</superscript> Pa) up to atmospheric pressure (10<superscript>5</superscript> Pa). This contribution is a short review on some microwave based plasma sources at different pressure ranges and a brief introduction into the plasma physics behind them (© 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim) [ABSTRACT FROM AUTHOR]

Details

Language :
English
ISSN :
08631042
Volume :
52
Issue :
7
Database :
Complementary Index
Journal :
Contributions to Plasma Physics
Publication Type :
Academic Journal
Accession number :
78644378
Full Text :
https://doi.org/10.1002/ctpp.201210057