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Formation and high-temperature stability of CoSix films on an SiO2 substrate.
- Source :
- Journal of Applied Physics; 5/15/1990, Vol. 67 Issue 10, p6265, 4p, 4 Black and White Photographs, 1 Diagram
- Publication Year :
- 1990
-
Abstract
- Examines the formation and high-temperature stability of cobalt silicide films on a silicon dioxide substrate. Details of the experimental procedures; Sheet resistance of the cobalt disilicide film; Effect of the presence of excess silicon in the silicide film.
- Subjects :
- COBALT compounds
SILICIDES
SILICA
THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 67
- Issue :
- 10
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7669734
- Full Text :
- https://doi.org/10.1063/1.345142