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GaAs-on-Si: Improved growth conditions, properties of undoped GaAs, high mobility, and fabrication of high-performance AlGaAs/GaAs selectively doped heterostructure transistors and ring oscillators.
- Source :
- Journal of Applied Physics; 3/1/1990, Vol. 67 Issue 5, p2343, 11p, 2 Charts, 11 Graphs
- Publication Year :
- 1990
-
Abstract
- Discusses a study on the improved growth conditions by molecular-beam epitaxy and fabrication of state-of-the-art aluminum gallium arsenide (GaAs)/GaAs selectively doped heterostructure transistors and ring oscillators on silicon substrates. Effects of substrate misorientation on 2DEG properties; Properties of the two-dimensional electron gas; Schottky diodes characteristics and doping profiles on undoped gallium arsenide-on-silicon.
- Subjects :
- MOLECULAR beam epitaxy
TRANSISTORS
GALLIUM arsenide
ALUMINUM
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 67
- Issue :
- 5
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7668260
- Full Text :
- https://doi.org/10.1063/1.345529