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Formation of Ni silicide from Ni(Au) films on (111)Si.
- Source :
- Journal of Applied Physics; 4/15/1996, Vol. 79 Issue 8, p4078, 9p, 2 Black and White Photographs, 8 Graphs
- Publication Year :
- 1996
-
Abstract
- Provides information on a study which examined the solid state reaction between a nitrogen film and a silicon substrate by scanning electron microscopy, x-ray diffraction and Rutherford backscattering spectrometry. Methods; Results and discussion; Conclusion.
- Subjects :
- NITROGEN
SILICON
SCANNING electron microscopy
X-ray diffraction
BACKSCATTERING
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 79
- Issue :
- 8
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7661593
- Full Text :
- https://doi.org/10.1063/1.361770