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Formation of Ni silicide from Ni(Au) films on (111)Si.

Authors :
Mangelinck, D.
Gas, P.
Grob, A.
Pichaud, B.
Thomas, O.
Source :
Journal of Applied Physics; 4/15/1996, Vol. 79 Issue 8, p4078, 9p, 2 Black and White Photographs, 8 Graphs
Publication Year :
1996

Abstract

Provides information on a study which examined the solid state reaction between a nitrogen film and a silicon substrate by scanning electron microscopy, x-ray diffraction and Rutherford backscattering spectrometry. Methods; Results and discussion; Conclusion.

Details

Language :
English
ISSN :
00218979
Volume :
79
Issue :
8
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7661593
Full Text :
https://doi.org/10.1063/1.361770