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Electron spectroscopic analysis of the SiO2/Si system and correlation with metal–oxide–semiconductor device characteristics.
- Source :
- Journal of Applied Physics; 5/1/1996, Vol. 79 Issue 9, p6653, 61p, 1 Black and White Photograph, 6 Diagrams, 14 Charts, 59 Graphs
- Publication Year :
- 1996
-
Abstract
- Presents information on a study that examined electron spectroscopy for chemical analysis (ESCA) measurement results on thin SiO[sub2]/Si samples. Summary of conventional ESCA measurements; Problems associated with ESCA measurements; Conclusions.
- Subjects :
- ANALYTICAL chemistry
THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 79
- Issue :
- 9
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7659899
- Full Text :
- https://doi.org/10.1063/1.362676