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Effect of different preparation conditions on light emission from silicon implanted SiO2 layers.
- Source :
- Journal of Applied Physics; 6/1/1996, Vol. 79 Issue 11, p8660, 4p, 6 Graphs
- Publication Year :
- 1996
-
Abstract
- Provides information on a study that performed continuous and time-gated photoluminescence of Si[sup+] implanted SiO[sub2] layers from the as-implanted samples. Experimental procedure; Results and discussion on the study; Conclusions.
- Subjects :
- SILICON oxide
PHOTOLUMINESCENCE
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 79
- Issue :
- 11
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7659540
- Full Text :
- https://doi.org/10.1063/1.362490