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Study of the structure in rf glow discharges in SiH4/H2 by spatiotemporal optical emission spectroscopy: Influence of negative ions.
- Source :
- Journal of Applied Physics; 12/1/1990, Vol. 68 Issue 11, p5532, 8p, 1 Diagram, 4 Charts, 5 Graphs
- Publication Year :
- 1990
-
Abstract
- Focuses on a study that investigated the influence of negative ions on the structure in radio frequency glow discharges in SiH[sub4]/H[sub2] by spatiotemporal optical emission spectroscopy. Method used to synthesize thin films; Description of the experimental apparatus used; Minimum sustaining voltages in various gases measured.
- Subjects :
- ANIONS
RADIO frequency discharges
GLOW discharges
EMISSION spectroscopy
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 68
- Issue :
- 11
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7644278
- Full Text :
- https://doi.org/10.1063/1.347013