Lattice imaging of metastable TiSi2.

Authors :: Chou, T. C.
Wong, C. Y.
Tu, K. N.
Source :: Journal of Applied Physics; 9/15/1987, Vol. 62 Issue 6, p2275, 5p
Publication Year :: 1987
Abstract: Studies the microstructure of metastable C49-TiSi[sub2] by high-resolution transmission electron microscopy in a bilayer thin film of titanium and silicon annealed at 700 degree celsius. Crystal structures of TiSi[sub2]; Reason for the metastability of C49-TiSi[sub2]; Factor to which the difference of electrical resistivity between metastable TiSi[sub2] and stable TiSi[sub2] may be attributed.