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Effective gettering of gold in silicon at 900 °C by low-current corona discharge.

Authors :
Falster, R. J.
Modlin, D. N.
Tiller, W. A.
Gibbons, J. F.
Source :
Journal of Applied Physics; 1/15/1985, Vol. 57 Issue 2, p554, 5p, 1 Diagram, 8 Graphs
Publication Year :
1985

Abstract

Reports on a novel technique for the removal of gold in silicon at 900 degree celsius. Examples of some techniques that have been shown to be effective in the removal of gold from silicon; Description of the techniques; Illustration of the apparatus used to generate the positive ion beam.

Subjects

Subjects :
GOLD
SILICON
ION bombardment

Details

Language :
English
ISSN :
00218979
Volume :
57
Issue :
2
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7630026
Full Text :
https://doi.org/10.1063/1.334736