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Thermal oxidation of reactively sputtered amorphous W80N20 films.
- Source :
- Journal of Applied Physics; 12/15/1990, Vol. 68 Issue 12, p6420, 4p
- Publication Year :
- 1990
-
Abstract
- Presents a study that investigated the oxidation behavior of reactively sputtered amorphous tungsten nitride thin films. Properties of tungsten nitride thin films; Details on the experimental procedures; Discussion on the results of the study.
- Subjects :
- OXIDATION
TUNGSTEN compounds
THIN films
Subjects
Details
- Language :
- English
- ISSN :
- 00218979
- Volume :
- 68
- Issue :
- 12
- Database :
- Complementary Index
- Journal :
- Journal of Applied Physics
- Publication Type :
- Academic Journal
- Accession number :
- 7627853
- Full Text :
- https://doi.org/10.1063/1.346863