Back to Search Start Over

Rotational slip in III-V heterostructures grown by molecular-beam epitaxy.

Authors :
Lind, M. D.
Sullivan, G. J.
Liu, T. Y.
Kroemer, H.
Source :
Journal of Applied Physics; 9/1/1988, Vol. 64 Issue 5, p2746, 3p, 2 Diagrams, 1 Chart, 2 Graphs
Publication Year :
1988

Abstract

Reports on the observation of rotational slip as a mechanism for relieving strain in III-V heterostructures grown by molecular beam epitaxy. Impact of rotational slip on the epitaxial layer; Relationship between the strain and the critical layer thickness; Description of rotational slip on planes.

Details

Language :
English
ISSN :
00218979
Volume :
64
Issue :
5
Database :
Complementary Index
Journal :
Journal of Applied Physics
Publication Type :
Academic Journal
Accession number :
7621722
Full Text :
https://doi.org/10.1063/1.342496