Cite
Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average.
MLA
Ko, Hyo-Heon, et al. “Advanced Semiconductor Fabrication Process Control Using Dual Filter Exponentially Weighted Moving Average.” Journal of Intelligent Manufacturing, vol. 23, no. 3, June 2012, pp. 443–55. EBSCOhost, https://doi.org/10.1007/s10845-010-0383-6.
APA
Ko, H.-H., Kim, J., Park, S.-H., Baek, J.-G., & Kim, S.-S. (2012). Advanced semiconductor fabrication process control using dual filter exponentially weighted moving average. Journal of Intelligent Manufacturing, 23(3), 443–455. https://doi.org/10.1007/s10845-010-0383-6
Chicago
Ko, Hyo-Heon, Jihyun Kim, Sang-Hoon Park, Jun-Geol Baek, and Sung-Shick Kim. 2012. “Advanced Semiconductor Fabrication Process Control Using Dual Filter Exponentially Weighted Moving Average.” Journal of Intelligent Manufacturing 23 (3): 443–55. doi:10.1007/s10845-010-0383-6.