Plasma potential mapping of high power impulse magnetron sputtering discharges.

MLA

Rauch, Albert, et al. “Plasma Potential Mapping of High Power Impulse Magnetron Sputtering Discharges.” Journal of Applied Physics, vol. 111, no. 8, Apr. 2012, p. 083302. EBSCOhost, https://doi.org/10.1063/1.3700242.

APA

Rauch, A., Mendelsberg, R. J., Sanders, J. M., & Anders, A. (2012). Plasma potential mapping of high power impulse magnetron sputtering discharges. Journal of Applied Physics, 111(8), 083302. https://doi.org/10.1063/1.3700242

Chicago

Rauch, Albert, Rueben J. Mendelsberg, Jason M. Sanders, and André Anders. 2012. “Plasma Potential Mapping of High Power Impulse Magnetron Sputtering Discharges.” Journal of Applied Physics 111 (8): 083302. doi:10.1063/1.3700242.