Ag2Te/As2S3: A high-contrast, top-surface imaging resist for 193 nm lithography.

Details

Language :

English

ISSN :

10711023

Volume :

14

Issue :

6

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures

Publication Type :

Academic Journal

Accession number :

74342180

Full Text :

https://doi.org/10.1116/1.588785