Molecular beam epitaxy of high-quality, nonstoichiometric multiple quantum wells.

MLA

Melloch, M. R., et al. “Molecular Beam Epitaxy of High-Quality, Nonstoichiometric Multiple Quantum Wells.” Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures, vol. 14, no. 3, May 1996, pp. 2271–74. EBSCOhost, https://doi.org/10.1116/1.588917.

APA

Melloch, M. R., Lahiri, I., Nolte, D. D., Chang, J. C. P., Harmon, E. S., Woodall, J. M., Li, N. Y., & Tu, C. W. (1996). Molecular beam epitaxy of high-quality, nonstoichiometric multiple quantum wells. Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures, 14(3), 2271–2274. https://doi.org/10.1116/1.588917

Chicago

Melloch, M. R., I. Lahiri, D. D. Nolte, J. C. P. Chang, E. S. Harmon, J. M. Woodall, N. Y. Li, and C. W. Tu. 1996. “Molecular Beam Epitaxy of High-Quality, Nonstoichiometric Multiple Quantum Wells.” Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures 14 (3): 2271–74. doi:10.1116/1.588917.