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Molecular beam epitaxy of high-quality, nonstoichiometric multiple quantum wells.

Authors :
Melloch, M. R.
Lahiri, I.
Nolte, D. D.
Chang, J. C. P.
Harmon, E. S.
Woodall, J. M.
Li, N. Y.
Tu, C. W.
Source :
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1996, Vol. 14 Issue 3, p2271-2274, 4p
Publication Year :
1996

Details

Language :
English
ISSN :
10711023
Volume :
14
Issue :
3
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
Publication Type :
Academic Journal
Accession number :
74341735
Full Text :
https://doi.org/10.1116/1.588917