Micromachining applications of a high resolution ultrathick photoresist.

Authors :: Lee, K. Y.
LaBianca, N.
Rishton, S. A.
Zolgharnain, S.
Gelorme, J. D.
Shaw, J.
Chang, T. H.-P.
Source :: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1995, Vol. 13 Issue 6, p3012-3016, 5p
Publication Year :: 1995

Language :: English
ISSN :: 10711023
Volume :: 13
Issue :: 6
Database :: Complementary Index
Journal :: Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
Publication Type :: Academic Journal
Accession number :: 74341187
Full Text :: https://doi.org/10.1116/1.588297