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Plasma deposited SiO2 for planar self-aligned gate metal-insulator-semiconductor field effect transistors on semi-insulating InP.
- Source :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1994, Vol. 12 Issue 1, p130-133, 4p
- Publication Year :
- 1994
Details
- Language :
- English
- ISSN :
- 10711023
- Volume :
- 12
- Issue :
- 1
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
- Publication Type :
- Academic Journal
- Accession number :
- 74340056
- Full Text :
- https://doi.org/10.1116/1.587169