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Electron-beam induced tungsten deposition: Growth rate enhancement and applications in microelectronics.

Authors :
Kohlmann-von Platen, K. T.
Buchmann, L.-M.
Petzold, H.-C.
BrĂ¼nger, W. H.
Source :
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures; 1992, Vol. 10 Issue 6, p2690-2694, 5p
Publication Year :
1992

Details

Language :
English
ISSN :
10711023
Volume :
10
Issue :
6
Database :
Complementary Index
Journal :
Journal of Vacuum Science & Technology: Part B-Microelectronics & Nanometer Structures
Publication Type :
Academic Journal
Accession number :
74339377
Full Text :
https://doi.org/10.1116/1.586027