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Physical properties of high pressure reactively sputtered TiO2.
- Source :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films; 2005, Vol. 23 Issue 6, p1523-1530, 8p
- Publication Year :
- 2005
Details
- Language :
- English
- ISSN :
- 07342101
- Volume :
- 23
- Issue :
- 6
- Database :
- Complementary Index
- Journal :
- Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films
- Publication Type :
- Academic Journal
- Accession number :
- 74338158
- Full Text :
- https://doi.org/10.1116/1.2056554