Controlling the composition of Ti1-xAlxN thin films by modifying the number of TiN and AlN subcycles in atomic layer deposition.

Details

Language :

English

ISSN :

07342101

Volume :

21

Issue :

5

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films

Publication Type :

Academic Journal

Accession number :

74337387

Full Text :

https://doi.org/10.1116/1.1590963