High rate sputtering for Ni films by an rf-dc coupled magnetron sputtering system with multipolar magnetic plasma confinement.

Details

Language :

English

ISSN :

07342101

Volume :

19

Issue :

4

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films

Publication Type :

Academic Journal

Accession number :

74336523

Full Text :

https://doi.org/10.1116/1.1351796