Cite
Characterization of 100 MHz inductively coupled plasma (ICP) by comparison with 13.56 MHz ICP.
MLA
Nakagawa, H., et al. “Characterization of 100 MHz Inductively Coupled Plasma (ICP) by Comparison with 13.56 MHz ICP.” Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, vol. 17, no. 4, July 1999, pp. 1514–19. EBSCOhost, https://doi.org/10.1116/1.581845.
APA
Nakagawa, H., Morishita, S., Noda, S., Okigawa, M., Inoue, M., Sekine, M., & Ito, K. (1999). Characterization of 100 MHz inductively coupled plasma (ICP) by comparison with 13.56 MHz ICP. Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films, 17(4), 1514–1519. https://doi.org/10.1116/1.581845
Chicago
Nakagawa, H., S. Morishita, S. Noda, M. Okigawa, M. Inoue, M. Sekine, and K. Ito. 1999. “Characterization of 100 MHz Inductively Coupled Plasma (ICP) by Comparison with 13.56 MHz ICP.” Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films 17 (4): 1514–19. doi:10.1116/1.581845.