Magnetic field optimization in a dielectric magnetically enhanced reactive ion etch reactor to produce an instantaneously uniform plasma.

Details

Language :

English

ISSN :

07342101

Volume :

16

Issue :

3

Database :

Complementary Index

Journal :

Journal of Vacuum Science & Technology: Part A-Vacuums, Surfaces & Films

Publication Type :

Academic Journal

Accession number :

74334792

Full Text :

https://doi.org/10.1116/1.581126